Semiconductor
High-purity graphite components for crystal growth, ion implantation and wafer processing.
Graphite solutions for Semiconductor
Silicon crystal growing, epitaxial deposition, ion implantation, and thermal oxidation all demand graphite components that combine ultra-low metallic contamination with precise dimensional stability at temperatures above 2000°C. Even sub-ppm levels of iron, nickel, or copper cause deep-level defects that compromise device performance across an entire wafer lot.
Expo Advanced Materials supplies ultra-high-purity graphite components — crucibles, susceptors, puller shafts, heaters, and insulation rings — from TOYO TANSO IG-110 and IG-430U, with full elemental analysis certificates and lot-level traceability from block to finished component.
| Grade (CZ silicon solar) | TTK-8 / ISO-88 — ash <50 ppm |
| Grade (CZ silicon semiconductor) | IG-110 / IG-430U — ash <10 ppm |
| Grade (Float Zone) | IG-110 HP — ash <5 ppm |
| Critical trace metals | Fe, Ni, Cu < 1 ppm each |
| Density | 1.77–1.85 g/cm³ |
| Max service temperature | 2800°C in inert atmosphere |
| Machining tolerance | ±0.02 mm standard; ±0.01 mm available |
| Packaging | Vacuum-sealed PE; cleanroom-ready on request |